Silicon NitrideSilicon Carbide
Silicon Nitride/Carbide
Silica
Alumina
Other oxide upon request
Silicon nitrides, silicon carbides and mixed silicon nitride/carbides are produced using a carefully controlled CO2 laser CVD process. Typical powders have a 20 nm diameter and relatively spherical having a dmax/dmin ratio of less than 2. Surface area of 20 nm powder typically will be in the 110 m2/gram.
Typical applications include monolithic ceramics and special coatings.
For more plate-like particles, these materials can also be manufactured using plasma CVD for applications that require this structure. Oxides can also be made using this process.
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Silicon nitride, silicon carbide and mixed silicon nitride/carbide are produced using a carefully controlled CO2 laser CVD process. Typical powders have a 20 nm diameter and a dmax/dmin of less than 2. Typical applications are monolithic ceramics and special coatings.
These silicon based materials can also be produced using plasma CVD for applications which require more plate like particles. | ||||||||||||||||||||||||||||||||||
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Iron nitride is a new material developed specifically for magnetic and optical/magnetic applications. This material is reported to have significantly improved magnetic
properties over rare earth compounds.
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A range of metal oxides and mixed metal oxides are available. Processing can be laser or plasma CVD.
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Nickel and cobalt metals, as well as, alloys are fabricated using proprietary carbon arc technology in research quantities. This method produces materials that are coated with carbon, thus eliminating at room temperature the problems associated with the oxidation of fine metal particles.
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Pure and mixed oxides are available with particle diameters
from 10 to 100 nm.
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